发明名称 |
ESD protection for high voltage applications |
摘要 |
An electrostatic discharge (ESD) protection device includes a diode located in a substrate and an N-type metal oxide semiconductor (NMOS) device located in the substrate adjacent the diode, wherein both the diode and the NMOS are coupled to an input device, and at least a portion of the diode and at least a portion of the NMOS device collectively form an ESD protection device.
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申请公布号 |
US7563653(B2) |
申请公布日期 |
2009.07.21 |
申请号 |
US20080113803 |
申请日期 |
2008.05.01 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY |
发明人 |
LEE JIAN-HSING;CHANG DENG-SHUN |
分类号 |
H01L21/332 |
主分类号 |
H01L21/332 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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