| 摘要 |
A chemically amplified positive resist composition and a chemically amplified positive resist film using the same are provided to ensure excellent sensitivity, resolution, applicability, and improved profile when forming patterns in a film thickness condition showing standing wave and reverse taper. A chemically amplified positive resist composition comprises: (A) resin which is arranged with a structure unit represented by the chemical formula 1 and a structure unit represented by the chemical formula 2 in a molar ratio of 2~5:5~8 in line, and has a glass transition temperature(Tg) of 150~170°C and the molecular weight of 9,000~11,000; (B) at least one resin selected from the group consisting of the chemical formula 3, 4, and 5; and (C) a photoacid generator represented by the chemical formula 6. |
