Methods for manufacturing SiO2 dielectric layers using low temperature liquid phase deposition technology,申请号KR20080040404-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	Methods for manufacturing SiO2 dielectric layers using low temperature liquid phase deposition technology
摘要
申请公布号	KR100985213(B1)	申请公布日期	2010.10.05
申请号	KR20080040404	申请日期	2008.04.30
申请人		发明人
分类号	H01L21/31;H01L21/208	主分类号	H01L21/31
代理机构		代理人
主权项
地址

您可能感兴趣的专利

FLUORORUBBER COMPOSITION

MEN'S UNDERWEAR

X-RAY DIAGNOSTIC APPARATUS AND CONTROL PROGRAM

METHOD FOR MANUFACTURING CEREAL FLOUR-CONTAINING FOOD PRODUCT, AND CEREAL FLOUR-CONTAINING DOUGH PACKED IN MICROWAVE EXOTHERMIC BAG

METHOD FOR DRIVING INFORMATION PROCESSING DEVICE, PROGRAM, AND INFORMATION PROCESSING DEVICE

IMAGE FORMATION APPARATUS

WIRING MATERIAL AND PRODUCTION METHOD OF THE SAME

LIGHT EMITTING COMPONENT, PRINT HEAD, IMAGE FORMING APPARATUS AND MANUFACTURING METHOD FOR LIGHT EMITTING COMPONENT

HEATER OF PRISMATIC VALVE, AND PRISMATIC VALVE EQUIPPED WITH THE SAME

LITHIUM ION BATTERY SEPARATOR AND COATING LIQUID FOR LITHIUM ION BATTERY SEPARATOR

CONTROL DEVICE OF BELT-TYPE CONTINUOUSLY VARIABLE TRANSMISSION

ROTARY TYPE VALVE DEVICE

IMAGE FORMING DEVICE, INFORMATION PROCESSING DEVICE, AND PROGRAM

HOLDING/RELEASE MECHANISM

WASHER WITH SPRING AND FASTENER

METHOD FOR MANUFACTURING A PROPYLENE POLYMER

ANALYZER, SPECIMEN ANALYTIC METHOD, AND COMPUTER READABLE STORAGE MEDIUM

METHOD FOR WORKING LAMINATED SHEET, AND WORKED LAMINATED SHEET