发明名称 |
Underlayer coating forming composition for lithography containing polysilane compound |
摘要 |
There is provided an underlayer coating for lithography that is used in lithography process of the manufacture of semiconductor devices, that can be used as a hardmask, and that causes no intermixing with photoresists; and a composition for forming the underlayer coating. The composition comprises a polysilane compound, a crosslinkable compound, a crosslinking catalyst and a solvent. The polysilane compound is preferably a polysilane compound having a bond between silicons at the main chain.
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申请公布号 |
US8163460(B2) |
申请公布日期 |
2012.04.24 |
申请号 |
US20060920840 |
申请日期 |
2006.05.12 |
申请人 |
TAKEI SATOSHI;HASHIMOTO KEISUKE;NAKAJIMA MAKOTO;NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
TAKEI SATOSHI;HASHIMOTO KEISUKE;NAKAJIMA MAKOTO |
分类号 |
G03F7/004;G03F7/075;G03F7/26 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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