| 摘要 |
<p>Disclosed is a cleaning apparatus for a helideck. According to an embodiment of the present invention, the cleaning apparatus for a helideck comprises: a moving unit moving by being installed in at least one beam of a first beam, and a second beam supporting a pancake unit; a cleaning unit hung on the moving unit in the form of a weight to be able to perform a pendulum motion having a plurality of injection nozzle units on the surface thereof; a cleaning medium supply unit supplying a cleaning medium to the cleaning unit; and a control unit controlling the injection order of the injection nozzle units in order for the cleaning unit to clean foreign materials attached to a surrounding structure while performing the pendulum motion.</p> |
