| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition and a method for forming a resist pattern.SOLUTION: A resist composition for EUV or EB comprises: a base component (A) which generates an acid by exposure and a solubility of which in a developer is changed by an action of an acid; and a resin component (C) having at least one selected from a fluorine atom and a silicon atom, and a polarity converting group that is decomposed by an action of a base to increase the polarity. The component (A) contains a component (A1) having a structural unit (a0) having a group represented by formula (a0-1) or (a0-2). The composition contains 1 to 15 parts by mass of (C) based on 100 parts by mass of (A). In the formulae, Qand Qrepresent a single bond or a divalent linking group. Rto Rrepresent an organic group, and -R-S(R)(R) has only one aromatic ring as a whole or does not have an aromatic ring. |
