发明名称 SEMICONDUCTOR CONSTRUCTIONS AND METHODS OF FORMING MEMORY CELLS
摘要 Some embodiments include semiconductor constructions having stacks containing electrically conductive material over dielectric material. Programmable material structures are directly against both the electrically conductive material and the dielectric material along sidewall surfaces of the stacks. Electrode material electrically coupled with the electrically conductive material of the stacks. Some embodiments include methods of forming memory cells in which a programmable material plate is formed along a sidewall surface of a stack containing electrically conductive material and dielectric material.
申请公布号 KR20150105424(A) 申请公布日期 2015.09.16
申请号 KR20157021415 申请日期 2014.04.04
申请人 MICRON TECHNOLOGY, INC. 发明人 CUPETA CARMELA;REDAELLI ANDREA;CAPPELLETTI PAOLO GIUSEPPE
分类号 H01L45/00;H01L27/24 主分类号 H01L45/00
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