发明名称 SHIELD GAS SUPPLY DEVICE OF LASER PROCESSOR, AND LASER PROCESSOR
摘要 PROBLEM TO BE SOLVED: To jet a shield gas efficiently to a processing workpiece when performing laser processing with a laser processor.SOLUTION: A shield gas supply device comprises: a ring-shaped part 8 arranged at a position which surrounds a laser beam L that irradiates a processing workpiece M from a laser processor 1; and a supply pipe 7 that supplies a shield gas to the ring-shaped part 8. The ring-shaped part 8 has a transfer path 15 for the shield gas supplied from the supply pipe 7 in a circumferential direction of the ring-shaped part 8. The transfer path 15 is arranged in a multi stage with respect to the workpiece M, and is provided with holes 12 to jet the shield gas so as to form swirl flows circumferentially in an inner peripheral part 11 of the ring-shaped part 8.
申请公布号 JP2015142932(A) 申请公布日期 2015.08.06
申请号 JP20140017227 申请日期 2014.01.31
申请人 OKAYAMA UNIV;MITSUI ENG & SHIPBUILD CO LTD 发明人 OKAMOTO YASUHIRO;OKADA AKIRA;ONO SHOZO;AKASE MASAYUKI;KIMURA RYOSUKE;OCHIAI HIKOTARO
分类号 B23K26/14;B23K26/00 主分类号 B23K26/14
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