| 摘要 |
<p> The objective of the present invention is to provide a gas-barrier film that maintains gas-barrier performance and has excellent adhesion between an anchor layer and a gas-barrier layer. This gas-barrier film (F) is characterized in that: the anchor layer (2) contains a silicon-containing filler; the gas-barrier layer (3) contains silicon oxycarbide, and the structure of the gas-barrier layer varies continuously in the layer thickness direction; the gas-barrier layer has a profile containing specified elements; and the difference (Ca-Cb) between the average value (Ca) of the ratio of the number of carbon atoms to the total number of carbon atoms, silicon atoms, and oxygen atoms measured using XPS in the entire region of the anchor layer (2), and the minimum value (Cb) of the ratio of the number of carbon atoms to the total number of carbon atoms, silicon atoms, and oxygen atoms measured using XPS in the entire region of the gas-barrier layer (3), is within the range of 5-35 at%.</p> |
