发明名称 EUV LIGHT SOURCE
摘要 <p>PROBLEM TO BE SOLVED: To solve the problem in which an EUV light source that provides a reticle with annular uniform highly bright EUV light and hardly contaminates an EUV collector mirror is demanded.SOLUTION: By providing a collector mirror that collects laser light irradiating a target to obtain EUV light with a number of slits or a number of fine tubes and making EUV light generated from a small range by repeating total internal reflections inside the number of slits or the number of fine tubes to diverge the EUV light, uniform illumination light having high intensity and large illumination numerical aperture is obtained at a reticle with one EUV light collector mirror or just a few illumination mirrors. An EUV generation source may be made large and high intensity may be achieved.</p>
申请公布号 JP2015138966(A) 申请公布日期 2015.07.30
申请号 JP20140037464 申请日期 2014.01.20
申请人 SHINOHARA YASUKO 发明人 SHINOHARA KATSUHIKO
分类号 H01L21/027;H05G2/00 主分类号 H01L21/027
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