摘要 |
<p>PROBLEM TO BE SOLVED: To solve the problem in which an EUV light source that provides a reticle with annular uniform highly bright EUV light and hardly contaminates an EUV collector mirror is demanded.SOLUTION: By providing a collector mirror that collects laser light irradiating a target to obtain EUV light with a number of slits or a number of fine tubes and making EUV light generated from a small range by repeating total internal reflections inside the number of slits or the number of fine tubes to diverge the EUV light, uniform illumination light having high intensity and large illumination numerical aperture is obtained at a reticle with one EUV light collector mirror or just a few illumination mirrors. An EUV generation source may be made large and high intensity may be achieved.</p> |