PELLICLE FOR EUV, ASSEMBLY FOR EUV USING THE SAME AND ASSEMBLING METHOD THEREOF

摘要

The present invention aims to provide a pellicle for EUV which can reduce shading contrast of the shadow of a mesh structure protected on a wafer; an assembly for EUV using the same; and a method for assembling the same. The pellicle for EUV of the present invention comprises: a pellicle membrane structure obtained by reinforcing a pellicle membrane with a mesh structure; and a pellicle frame which maintains the pellicle membrane structure. The mesh structure is projected as two kinds of shade of shapes on the wafer as EUV light is reflected by a mask surface and passes through the pellicle for EUV two times. The mesh structure is set to have a stand-off value whereby a contrast ratio of the shades of shapes can be reduced to 25% or lower. The stand-off value is set within a range of 0.3-1.0 mm.