发明名称 FUEL CELL
摘要 A fuel cell includes a membrane electrode assembly, a separator, a reactant gas channel, a reactant gas manifold, and a buffer portion. The buffer portion includes a first buffer region and a second buffer region. The second buffer region is located in a vicinity of the reactant gas manifold and is deeper than the first buffer region in a stacking direction. Embossed portion groups are arranged in a plurality of rows in the second buffer region between the reactant gas manifold and the first buffer region. Each of the embossed portion groups includes a plurality of embossed portions. A disposition density of the plurality of embossed portions of one of the embossed portion groups in a vicinity of the reactant gas manifold is lower than a disposition density of the plurality of embossed portions of another of the embossed portion groups in a vicinity of the first buffer region.
申请公布号 US2015207164(A1) 申请公布日期 2015.07.23
申请号 US201514601230 申请日期 2015.01.21
申请人 HONDA MOTOR CO., LTD. 发明人 ISHIDA Kentaro;NAGUMO Kenji;KIMURA Yoshihito;TOMANA Yu
分类号 H01M8/10;H01M8/04;H01M8/02 主分类号 H01M8/10
代理机构 代理人
主权项 1. A fuel cell comprising: a membrane electrode assembly and a separator that are stacked, the membrane electrode assembly including an electrolyte membrane and a pair of electrodes sandwiching the electrolyte membrane therebetween; a reactant gas channel through which a reactant gas is supplied along an electrode surface of the membrane electrode assembly; a reactant gas manifold through which the reactant gas flows in a stacking direction in which the separator is stacked; and a buffer portion that connects the reactant gas manifold to the reactant gas channel, wherein the buffer portion includes a first buffer region and a second buffer region, the first buffer region being located near the reactant gas channel and including a plurality of guide channels, the second buffer region being located near the reactant gas manifold and being deeper than the first buffer region in the stacking direction, wherein embossed portion groups are arranged in a plurality of rows in the second buffer region between the reactant gas manifold and the first buffer region, each of the embossed portion groups including a plurality of embossed portions, and wherein a disposition density of the embossed portions of one of the embossed portion groups near the reactant gas manifold is lower than a disposition density of the embossed portions of another of the embossed portion groups near the first buffer region.
地址 Tokyo JP