FABRICATION METHOD FOR PATTERN-FORMED STRUCTURE

摘要

An object of the present invention is to provide a fabrication method for pattern-formed structure having a smooth three-dimensional structure through a fewer processes. To achieve the object, the present invention provides a fabrication method for pattern-formed structure comprising: a dot modulation pattern forming process of binarizing a shape of a targeted three-dimensional structure to form a dot modulation pattern, a writing process of using the dot modulation pattern to write directly by a writer on a photosensitive resin layer formed on a substrate, and a developing process of developing the photosensitive resin layer after the writing to form a resin layer with three-dimensional structure, wherein the writing process is performed by a writing energy supplying method in which writing energy is supplied to the photosensitive resin layer by an area larger than a minimum dot area in the dot modulation pattern.

主权项

1. A fabrication method for pattern-formed substrate comprising:
fabricating a patter-formed structure, wherein the fabrication of the pattern-formed structure comprises:
a dot modulation pattern forming process of binarizing a shape of a targeted three-dimensional structure to form a dot modulation pattern,a writing process of using the dot modulation pattern to write directly by a writer on a photosensitive resin layer formed on a substrate, anda developing process of developing the photosensitive resin layer after the writing to form a resin layer with three-dimensional structure,wherein the writing process is performed by a writing energy supplying method in which writing energy is supplied to the photosensitive resin layer by an area larger than a minimum dot area in the dot modulation pattern; and etching the substrate of the pattern-formed structure along a shape of the resin layer with three-dimensional structure of the pattern-formed structure.