| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate for magnetic semiconductor, a manufacturing method for the same and a manufacturing apparatus for the same that can shorten the introduction time of magnetic atoms to a substrate and can provide a magnetic semiconductor usable even at room temperature.SOLUTION: A substrate for magnetic semiconductor comprises: a diffusion receiving layer 103 of semiconductor in which a thin film of magnetic atoms is formed on the irradiation surface to be irradiated by laser; and a thermal conduction suppressing layer 102 which is in contact with a surface opposite to the irradiation surface of the diffusion receiving layer and that has thermal conductivity lower than that of the diffusion receiving layer. |
