发明名称 CPP Device with a Plurality of Metal Oxide Templates in a Confining Current Path (CCP) Spacer
摘要 A novel CCP scheme is disclosed for a CPP-GMR sensor in which an amorphous metal/alloy layer such as Hf is inserted between a lower Cu spacer and an oxidizable layer such as Al, Mg, or AlCu prior to performing a pre-ion treatment (PIT) and ion assisted oxidation (IAO) to transform the amorphous layer into a first metal oxide template and the oxidizable layer into a second metal oxide template both having Cu metal paths therein. The amorphous layer promotes smoothness and smaller grain size in the oxidizable layer to minimize variations in the metal paths and thereby improves dR/R, R, and dR uniformity by 50% or more. A thin Cu layer may be inserted between the amorphous layer and oxidizable layer before the PIT and IAO processes are performed.
申请公布号 US2015170836(A1) 申请公布日期 2015.06.18
申请号 US201514628508 申请日期 2015.02.23
申请人 TDK Corporation ;Kabushiki Kaisha Toshiba 发明人 Zhang Kunliang;Li Min;Liu Yue;Fukuzawa Hideaki;Yuasa Hiromi
分类号 H01F41/30 主分类号 H01F41/30
代理机构 代理人
主权项 1. A method of forming a confining current path (CCP) spacer in a magnetic sensor structure, comprising: (a) forming a first copper layer on a ferromagnetic layer; (b) forming an amorphous layer made of metal, alloy, or metal oxide on said first Cu layer; (c) forming a second copper layer with a thickness of 0 to 6 Angstroms on the amorphous layer; (d) depositing an oxidizable layer on the second copper layer; (e) performing a pre-ion treatment (PIT) followed by an ion-assisted oxidation (IAO) to transform the amorphous layer into a first metal oxide template having segregated Cu metal paths therein, and to transform the oxidizable layer into a second metal oxide template having segregated Cu metal paths formed therein; and (f) depositing a third Cu layer on the second metal oxide template.
地址 Tokyo JP