SALT, RESIST COMPOSITION, AND METHOD OF PRODUCING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a salt which allows a resist pattern to be produced with a good mask error factor (MEF), and a resist composition containing the salt.SOLUTION: The salt is represented by formula (I) [where Rand Reach independently represent a hydrogen atom, a hydroxy group, or a C1-C12 hydrocarbon group, provided that -CH- contained in the hydrocarbon group may be substituted with -O- or -CO-; m and n each independently represent 1 or 2; two R's are the same or different from each other when m is 2; two R's are the same or different from each other when n is 2; Ar represents an optionally substituted C6-C36 aromatic hydrocarbon group or an optionally substituted C6-C36 heteroaromatic hydrocarbon group; and Arepresents an organic anion].