| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition which is capable of forming a cured film achieving a good balance in required characteristics for a protective film or an interlayer insulating film at a high level and which can be developed even with an inorganic alkali developer solution. <P>SOLUTION: The radiation-sensitive composition contains a polysiloxane [B] which is obtained by subjecting [A<SP POS="POST">1</SP>] a hydrolyzable silane compound represented by the following formula (1) or its partial hydrolysate and a hydrolyzable silane compound represented by the following formula (2) or its partial hydrolysate to a hydrolytic condensation reaction, a copolymer containing (B<SP POS="POST">1</SP>) a structural unit having a carboxylic group and (B<SP POS="POST">2</SP>) a structural unit having an epoxy group, [C] a compound having two or more ethylenically unsaturated groups (excluding the component [A<SP POS="POST">1</SP>]) and [D] a photo-radical polymerization initiator (wherein, R<SP POS="POST">1</SP>and R<SP POS="POST">3</SP>represent alkyl groups having 1 to 6 carbon atoms, R<SP POS="POST">2</SP>represents an alkyl group having 1 to 20 carbon atoms or the like, m represents an integer of 0 to 3, n represents an integer of 0 to 6, x represents an integer of 1 to 3, y represents an integer of 1 to 6 and z represents an integer of 0 to 3.) <P>COPYRIGHT: (C)2013,JPO&INPIT |
