| 摘要 |
PROBLEM TO BE SOLVED: To provide a technique advantageous to achieve a wide visual field and a wide measurement range and achieve miniaturization in respect to a measurement instrument which measures a shape of a specimen by a pattern projection method.SOLUTION: A measurement instrument for measuring a shape of a specimen includes: an emission unit which emits pattern light; an optical system which irradiates the specimen with the pattern light emitted from the emission unit; a deflecting unit which deflects light emitted from the optical system; an imaging unit which images the specimen irradiated with the pattern light, via the optical system; and a processing unit which determines a shape of the specimen on the basis of the image of the specimen captured by the imaging unit. The deflecting unit includes a deflecting element in which a deflection direction is different by a polarized state of incident light. |
