发明名称 WAFER TRANSFER OF TRANSFER OF WAFER INSPECTION SYSTEM FOR SCANNING ELECTRON MICROSCORPE
摘要 The present invention relates to a transfer device for a high-degree vacuum inspection system, which provides an ease of supply and release of a substrate to be inspected, can be quickly exchanged to a low-degree vacuum or a high-degree vacuum state, and reduce the volume of a high-degree vacuum inspection system to minimize an installation space and to maximize inspection efficiency, and comprises: a substrate access unit installed to supply a substrate to be inspected to an upper portion of a high-degree vacuum chamber comprising a high-degree vacuum inspection system wherein an electron microscope is mounted for inspecting a substrate, and discharging a substrate to be inspected and finished; and a substrate transfer unit transferring a substrate received through the substrate access unit inside the high-degree vacuum chamber to a direction of the electron microscope to be inspected, and installed to transfer a substrate to be inspected and finished to the substrate access unit.
申请公布号 KR20150048400(A) 申请公布日期 2015.05.07
申请号 KR20130128398 申请日期 2013.10.28
申请人 PARK, JI HOON 发明人 PARK, JI HOON;KIM, SEONG UK
分类号 H01L21/677;H01L21/66 主分类号 H01L21/677
代理机构 代理人
主权项
地址