| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To inspect the composition ratio of a compound deposited on a substrate in a system where the substrate moves. <P>SOLUTION: The film deposition device has a film deposition zone 11 of a first step for depositing a group IIIB element(Y) and a group VIB element(Z) on a substrate 2, a film deposition zone 12 of a second step for depositing a group IB element(X) and a group VIB element on a thin film formed in the film deposition zone 11, and a film deposition zone 13 of a third step for depositing a group IIIB element and a group VIB element on a thin film through the film deposition zone 12. Based on the position of the film deposition zone 12 where an XYZ<SB POS="POST">2</SB>thin film compound formed on the substrate 2 in the film deposition zone 12 becomes a stoichiometric composition ratio, the composition ratio of the group IB element and group IIIB element of the XYZ<SB POS="POST">2</SB>thin film compound is calculated at the end point of the film deposition zone 13. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
