发明名称 Methods and system for analysis and management of parametric yield
摘要 Impact on parametric performance of physical design choices for transistors is scored for on-current and off-current of the transistors. The impact of the design parameters are incorporated into parameters that measure predicted shift in mean on-current and mean off-current and parameters that measure predicted increase in deviations in the distribution of on-current and the off-current. Statistics may be taken at a cell level, a block level, or a chip level to optimize a chip design in a design phase, or to predict changes in parametric yield during manufacturing or after a depressed parametric yield is observed. Further, parametric yield and current level may be predicted region by region and compared with observed thermal emission to pinpoint any anomaly region in a chip to facilitate detection and correction in any mistakes in chip design.
申请公布号 US8997028(B2) 申请公布日期 2015.03.31
申请号 US201313867621 申请日期 2013.04.22
申请人 Mentor Graphics Corporation 发明人 Culp James A.;Chang Paul;Chidambarrao Dureseti;Elakkumanan Praveen;Hibbeler Jason;Mocuta Anda C.
分类号 G06F17/50;G01R31/26 主分类号 G06F17/50
代理机构 Klarquist Sparkman, LLP 代理人 Klarquist Sparkman, LLP
主权项 1. A method of identifying a location of anomalous functionality on a semiconductor chip, said method comprising: by a computer: determining at least one of spatial distribution of on-current within said semiconductor chip and spatial distribution of off-current within said semiconductor chip;converting one of said spatial distribution of on-current and said spatial distribution of said off-current into an estimated spatial temperature distribution map; andgenerating a measured temperature distribution map of said semiconductor chip in an on-state or an off-state for comparison with said estimated spatial temperature distribution map.
地址 Wilsonville OR US