| 发明名称 | Matrix for detection/analysis of residues | ||
| 摘要 | Provided is a device and method for detecting the presence of a material in a gaseous medium, including a reaction assembly including at least one detection unit including a matrix adapted for exposure to the gaseous medium, such that at least part of the gaseous medium comes into contact with the matrix; the matrix being configured for capturing a gas-born particle of a material carried by the gaseous medium, and for permitting a liquid or solute reagent to come in contact with the matrix, thereby enabling said liquid reagent to react with said particle to yield an optically altered reaction product. | ||
| 申请公布号 | US8988687(B2) | 申请公布日期 | 2015.03.24 |
| 申请号 | US200812741279 | 申请日期 | 2008.11.03 |
| 申请人 | Aphelion Ltd. | 发明人 | Hirsch Israel |
| 分类号 | G01N21/00;G01N31/22;G01N21/84;G01N1/22;G01N21/78;G01N21/77;G01N15/06 | 主分类号 | G01N21/00 |
| 代理机构 | Vorys, Sater, Seymour and Pease LLP | 代理人 | Vorys, Sater, Seymour and Pease LLP ;Hopkins Susanne M. |
| 主权项 | 1. A device for detecting one or more materials borne in a gaseous medium, the device comprising: a reaction assembly comprising at least one detection unit comprising a matrix configured to physically capture said one or more materials in particulate form, said one or more materials having a particle size between about 0.1 and 1000 micrometers from a flow of said gaseous medium, and configured to permit a liquid or solute reagent to come in contact with the matrix, thereby enabling said liquid or solute reagent to react with said one or more materials of particulate form to yield an optically altered reaction product. | ||
| 地址 | Herzelia IL | ||