| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern excellent in pattern collapse resistance can be produced.SOLUTION: The resist composition comprises a resin including a structural unit having an acid-labile group, an acid generator expressed by formula (I), a compound expressed by formula (II), and a solvent. The solvent contains an ether ester solvent and an ether solvent. In the formulae, Xrepresents an alkanediyl group optionally having a substituent, in which a constituent methylene may be replaced by an oxygen atom or a carbonyl group; Rrepresents a hydrocarbon group optionally having a substituent, in which a constituent methylene group may be replaced by an oxygen atom or a carbonyl group; Zrepresents an organic cation; ring Wrepresents a saturated heterocycle; and Rrepresents a hydrocarbon group, in which a constituent methylene group is replaced by an oxygen atom or a carbonyl group. |
