发明名称 NON-LITHOGRAPHICALLY PATTERNED DIRECTED SELF ASSEMBLY ALIGNMENT PROMOTION LAYERS
摘要 A method of an aspect includes forming a directed self assembly alignment promotion layer over a surface of a substrate having a first patterned region and a second patterned region. A first directed self assembly alignment promotion material is formed selectively over the first patterned region without using lithographic patterning. The method also includes forming an assembled layer over the directed self assembly alignment promotion layer by directed self assembly. A plurality of assembled structures are formed that each include predominantly a first type of polymer over the first directed self assembly alignment promotion material. The assembled structures are each adjacently surrounded by predominantly a second different type of polymer over the second patterned region. The first directed self assembly alignment promotion material has a greater chemical affinity for the first type of polymer than for the second different type of polymer.
申请公布号 WO2014209327(A1) 申请公布日期 2014.12.31
申请号 WO2013US48307 申请日期 2013.06.27
申请人 INTEL CORPORATION;BRISTOL, ROBERT L.;HOURANI, RAMI;HAN, EUNGNAK;BLACKWELL, JAMES M. 发明人 BRISTOL, ROBERT L.;HOURANI, RAMI;HAN, EUNGNAK;BLACKWELL, JAMES M.
分类号 H01L21/027;H01L21/28 主分类号 H01L21/027
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