| 摘要 |
PROBLEM TO BE SOLVED: To prepare a pattern of a mask capable of forming, in a sufficient precision, an image of the pattern atop a substrate.SOLUTION: In a preparation method for preparing, via calculation by an information processing device, a pattern of a mask used for an exposure device, a reference map of characteristics values of an image of a representative main pattern in relation to positions of a representative subsidiary pattern calculated, while the representative subsidiary pattern position in relation to the representative main pattern is being varied, at multiple positions is applied to a targeted main pattern so as to calculate a map of characteristic values of the main pattern in relation to the positions of the subsidiary pattern. The position of the subsidiary pattern is determined by using the data of the map of characteristic values of the image of the main pattern so as to prepare a pattern of a mask including the main pattern and the subsidiary pattern thus determined. |
