| 摘要 |
<p>A liquid immersion exposure apparatus that exposes a substrate with exposure light and a cleaning method of the liquid immersion exposure apparatus includes holding a plate member by a holding section of a substrate stage that can hold the substrate, confining a liquid between a first member and the plate member, thereby a liquid immersion area is formed on a portion of an upper surface of the plate member, the portion being less than the upper surface, varying at least one of a supply rate and a recovery rate of the liquid to move an interface of the liquid between the first member and the plate member, thereby removing a foreign substance from the first member, and unloading the plate member from the substrate stage.</p> |
