| 发明名称 | Method of coating a substrate | ||
| 摘要 | There is provided a method of coating a substrate with a zinc oxide film. The method includes (a) providing a substrate with at least one substantially flat surface, (b) subjecting the surface at least partially to a plasma-etching process, and (c) depositing on the etched surface, a layer that includes zinc oxide. The method is particularly suitable for manufacturing solar cells. | ||
| 申请公布号 | US8900674(B2) | 申请公布日期 | 2014.12.02 |
| 申请号 | US201013500565 | 申请日期 | 2010.09.27 |
| 申请人 | Tel Solar AG | 发明人 | Borrello Daniel;Vallat-Sauvain Evelyne;Kroll Ulrich;Meier Johannes |
| 分类号 | C23C14/02;C23C16/40;C23C14/08;H01L31/0368;H01L31/075;H01L31/0376;C23C16/02;H01L31/0747;C23C30/00;H01L31/0224;H01L31/18;H01L31/0236;H01L31/0392 | 主分类号 | C23C14/02 |
| 代理机构 | Ohlandt, Greeley, Ruggiero & Perle, LLP | 代理人 | Ohlandt, Greeley, Ruggiero & Perle, LLP |
| 主权项 | 1. A method of coating a substrate with a zinc oxide film, the method comprising: providing a glass substrate with a surface that is substantially flat; subjecting said surface at least partially to a plasma-etching process that uses a plasma of a mixture of sulphur hexafluoride and oxygen in a ratio of 5/1, thus yielding an etched surface; and depositing on said etched surface, a layer comprising zinc oxide, wherein the zinc oxide is deposited by low pressure vapour deposition. | ||
| 地址 | Trubbach CH | ||