电解铜箔及覆铜层积板,申请号TW098122901-传众专利搜索

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发明名称	电解铜箔及覆铜层积板
摘要	一种电解铜箔，用于提供具有与轧制铜箔同等或其以上的柔软性弯曲性之电解铜箔，对电解铜箔施予使式1所示的LMP值成为9000以上的加热处理后，对于结晶构造以EBSP分析的面而言，红系蓝系的任一色调占80%以上；;式1：LMP=(T+273)＊(20+Log t);此处，20系铜的材料常数，T系温度(℃)，t系时间(hr)。;在施予加热处理后的电解铜箔之X线绕射分析中，对于(111)面而言，(331)面的相对强硬较佳为15以上。
申请公布号	TWI463038	申请公布日期	2014.12.01
申请号	TW098122901	申请日期	2009.07.07
申请人	古河电气工业股份有限公司日本	发明人	铃木裕二;斋藤贵广
分类号	C25D1/04;C25D5/48	主分类号	C25D1/04
代理机构		代理人	洪澄文台北市南港区三重路19之6号2楼
主权项	一种电解铜箔，对电解铜箔施予使式1所示的LMP值(拉森-米勒参数)成为9000以上的加热处理后，对于结晶构造以EBSP(电子背向散射绕射图案)分析的面而言，红系．蓝系的任一色调占80%以上的电解铜箔：式1：LMP=(T+273)＊(20+Log t)此处，20系铜的材料常数，T系温度(℃)，t系时间(hr)。
地址	日本

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