SEMICONDUCTOR DEVICE CLEANING LIQUID AND METHOD FOR CLEANING SEMICONDUCTOR DEVICE SUBSTRATE

摘要

An object of the present invention is to provide a good cleaning liquid for semiconductor device which is used after a CMP step, and the present invention relates to a cleaning liquid for semiconductor device containing the following components (1) to (5) or (1)′to (4)′: (1) an inorganic alkali; (2) a chelating agent; (3) an anionic surfactant selected from sulfonic acid type and sulfuric acid type anionic surfactants; (4) an amine oxide type surfactant; and (5) water, or (1)′an inorganic alkali; (2)′a carboxyl group-containing chelating agent; (3)′an anionic surfactant selected from a benzenesulfonic acid substituted with an alkyl group having from 8 to 20 carbon atoms and a salt thereof; and (4)′water.