| 摘要 |
<p>Disclosed is a substrate processing apparatus. In a substrate processing apparatus according to the present invention, a heater is inserted into a main body in the left, right, and back side of the main body. A terminal plate formed in the other end of the heater exposed to the outside of the main body is combined with the main body. The terminal plate is connected to an external power part or the terminal plate is installed in the case to expose the heater in the outside of the case when the cover is separated. After that, the external power part is connected to the terminal, thereby simplifying the installation and maintenance. And, the radiant heat emitted from the heater is reflected by a reflection plate. Therefore, because a substrate is heated by the radiant heat emitted from the heat and the radiant heat reflected by the reflection plate, the substrate can be heated with high temperature by using low energy.</p> |
