Gasentwicklungsapparat nach Kipp,申请号DENDATM128237D-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	Gasentwicklungsapparat nach Kipp
摘要
申请公布号	DE633664(C)	申请公布日期	1938.07.04
申请号	DENDATM128237D	申请日期
申请人	ROBERT MUELLER KOMM.-GES., FABRIK CHEMISCHER APPARATE	发明人
分类号	B01J7/02	主分类号	B01J7/02
代理机构		代理人
主权项
地址

您可能感兴趣的专利

AMOLED display devices and methods for producing the sub-pixel structure thereof

Phototransistor and semiconductor device

Thin film transistor substrate, display apparatus having the same, and manufacturing method thereof

Ultrathin body (UTB) FinFET semiconductor structure

Semiconductor device and method of fabricating the same

Semiconductor device having three-dimensional structure and method of manufacturing the same

Strain tunable light emitting diodes with germanium P-I-N heterojunctions

Integrated electronic package and method of fabrication

Packaging devices and methods of manufacture thereof

Array substrate and organic light-emitting display including the same

Semiconductor package with small gate clip and assembly method

Feedback control using detection of clearance and adjustment for uniform topography

Semiconductor device having reduced-damage active region and method of manufacturing the same

Substrate storage container and exposure apparatus

Method for suppressing lattice defects in a semiconductor substrate

Replacement metal gate FinFET

Method of multiple zone symmetric gas injection for inductively coupled plasma

Neutron generator having multiple extractors with independently selectable potentials

Oscillator-type switch

Solid electrolytic capacitor, electronic component module, method for producing solid electrolytic capacitor and method for producing electronic component module