发明名称 Cleaning agent composition for APR mask and equipment
摘要 PURPOSE: A basic stripping solution composition is provided to have excellent cleaning power, be environmentally friendly, prevent loss of cleaning power, and have superior material stability and corrosion resistance for a metal material. CONSTITUTION: A basic stripping solution composition comprises 1-10 weight% of polyethylene glycol, polypropylene glycol, or alkyl components; polyalkylene glycol which is selected from diprotic alcohols of which average molecular weight is 200-1,000 and viscosity of 50-150 cps; 10-50 weight% of a monoalkylene glycol which is selected from diprotic alcohols of monoethylene glycol, monopropylene glycol, monobutylene glycol; 2-5 weight% of tetraalkylammonium hydroxide; 10-30 weight% of a protic glycol-based organic solvent; 5-15 weight% of a water-soluble compound; and 6-30 weight% of water. [Reference numerals] (AA) Classification; (BB) Specimen preparation; (CC) 2 minutes; (DD) Example 4; (EE) Comparative example 4
申请公布号 KR101453340(B1) 申请公布日期 2014.10.21
申请号 KR20120121820 申请日期 2012.10.31
申请人 发明人
分类号 C09K13/02 主分类号 C09K13/02
代理机构 代理人
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