发明名称 CONTROLLED VAPOR-PHASE DEPOSITION OF MULTILAYER COATING TO BE ADHERED THROUGH OXIDATION LAYER
摘要 <p>PROBLEM TO BE SOLVED: To provide an improved method and an improved apparatus for vapor-phase deposition which form a multilayer film/coating on a substrate.SOLUTION: An improved vapor-phase deposition method is for depositing a multilayer coating and controls the thickness of an oxide layer coming in direct contact with a substrate 106 as a factor in correlation with the chemical composition of the substrate to secure good bonding of a layer to be deposited subsequently to the oxide layer. The improved method comprises depositing the oxide layer directly onto the substrate and then depositing an organic layer directly onto the oxide layer. Typically, the oxide layer and the organic layer are arranged alternately to form a series of layers.</p>
申请公布号 JP2014196568(A) 申请公布日期 2014.10.16
申请号 JP20140116022 申请日期 2014.06.04
申请人 APPLIED MICROSTRUCTURES INC 发明人 KOBRIN BORIS;CHINN JEFFREY D;NOWAK ROMUALD;YI RICHARD C
分类号 C23C16/40;B05D3/14;B05D7/00;B05D7/24;B21D39/00;B32B9/00;B32B15/04;C23C16/00;C23C16/02;C23C16/30;C23C16/448;C23C16/455;C23C16/56;H01L21/312 主分类号 C23C16/40
代理机构 代理人
主权项
地址