| 摘要 |
An etching device for the electrolytic etching of copper on an etching material, includes a first mixing device, which is designed to receive an acid electrolyte containing copper ions, and an oxygen gas or ozone gas in order to form a first liquid-gas mixture which can be channeled from a first outlet of the first mixing device into a connecting line coupled thereto; a container, which contains a container liquid, a second mixing device, which is arranged in the container and is surrounded by the container liquid, wherein the second mixing device includes a suction opening in order to suction in the container liquid present in the region of the suction opening, wherein the second mixing device is connected to the connecting line and is designed to channel the first liquid-gas mixture and the suctioned container liquid into a constricted zone of the second mixing device so that the suctioned container liquid mixes with the first liquid-gas mixture and is thus able to form a second liquid-gas mixture, wherein the second mixing device has a second outlet out of which the second liquid-gas mixture is able to flow and mix with the container liquid present in the region of the second outlet, and a container outlet line, which is designed to feed the container liquid present there to the etching material provided in an etching module. |
