Semiconductor device and manufacturing method thereof

摘要

This invention discloses a semiconductor device and its manufacturing method. According to the method, a stop layer is deposited on a step-shaped bottom electrode, and then a first insulating layer is deposited through a high aspect ratio process. A first chemical mechanical polishing is performed until the stop layer. A second chemical mechanical polishing is then performed to remove the upper horizontal portion of the bottom electrode. Then, a phase-change material can be formed on the vertical portion of the bottom electrode to form a phase-change element. Through arranging a stop layer, the chemical mechanical polishing process is divided into two stages. Thus, during the second chemical mechanical polishing process preformed on the bottom electrode, polishing process can be precisely controlled to avoid the unnecessary loss of the bottom electrode.

主权项

1. A semiconductor device comprising:
a substrate; an L-shaped electrode disposed above the substrate, said electrode having a vertical portion and a lower horizontal portion, said vertical portion having a first vertical side surface, a second vertical side surface opposite said first vertical side surface, and an upper end surface connected to said first vertical side surface and said second vertical side surface at a top of said L-shape, said lower horizontal portion extending from a bottom of the vertical portion, said lower horizontal portion having an top horizontal surface extending horizontally from and connected to said second vertical side surface at a corner portion of said L-shape, a bottom horizontal surface extending horizontally from and connected to said first vertical side surface at said corner portion of said L-shape, and a lower end surface extending vertically from said top horizontal surface to said bottom horizontal surface and connected to said top horizontal surface and said bottom horizontal surface, and wherein a width of the lower horizontal portion between the top horizontal surface and the bottom horizontal surface is constant; a first insulating layer; and an L-shaped stop layer disposed between the electrode and the first insulating layer, said L-shaped stop layer having a horizontal portion overlaying and in contact with said top horizontal surface of said lower horizontal portion of said electrode, a side portion overlaying and in contact with said lower end surface of said lower horizontal portion of said electrode, and a vertical portion adjacent to and in contact with said vertical portion of said electrode; said L-shaped stop layer and said first insulating layer having different chemical mechanical polishing selectivity ratios.