发明名称 |
METHOD FOR MANUFACTURING COLOR FILTER |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a color filter in which separation of a color filter is suppressed in a step of removing a resist pattern.SOLUTION: The method for manufacturing a color filter comprises: a cured film forming step in which a cured film that contains metal oxide particles having a primary particle diameter of 1 nm to 100 nm is formed on a supporting body; a colored layer forming step in which a colored layer is formed on the cured film; a photoresist layer forming step in which a photoresist layer is formed on the colored layer; a pattern forming step in which a resist pattern is formed on the colored layer by removing the photoresist layer into the form of a pattern; an etching step in which the colored layer is etched using the resist pattern as an etching mask by a dry etching process using an etching gas; and a resist pattern removing step in which the remaining resist pattern is removed after the etching step. |
申请公布号 |
JP2014157351(A) |
申请公布日期 |
2014.08.28 |
申请号 |
JP20140006087 |
申请日期 |
2014.01.16 |
申请人 |
FUJIFILM CORP |
发明人 |
TAKAKUWA HIDEKI;YOSHIBAYASHI KOJI;SHIMADA KAZUTO |
分类号 |
G02B5/20;G02F1/1335;H01L27/14 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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