Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

摘要

Determining line edge roughness comprises reflecting at least one radiation beam off the object, observing a first optical response signature from a beam reflected from the object, or a component thereof, being polarized with an electrical vector in a first orientation relative to the object; and observing a second optical response signature from a beam reflected from the object, or a component thereof, being polarized with an electrical vector in a second orientation relative to the object. Line edge roughness can then be determined from the two optical response signatures.

主权项

1. A method comprising:
obtaining a first optical response signature from a first radiation beam reflected from an object, the first radiation beam being polarized with a first electrical vector in a first orientation relative to the object; obtaining a second optical response signature from a second radiation beam reflected from the object, the second radiation beam being polarized with a second electrical vector in a second orientation relative to the object; determining a first effective critical dimension (ECD) and a second ECD of the object based on the first and second optical response signatures, respectively; and determining a parameter related to edge roughness of the object based on the first ECD and the second ECD.