发明名称 DETERMINING THE DOPANT CONTENT OF A COMPENSATED SILICON SAMPLE
摘要 Method for determining dopant impurities concentrations in a silicon sample involves provision of a silicon ingot including donor type dopant impurities and acceptor type dopant impurities, a step for determining the position of a first area of the ingot in which a transition takes place between a first conductivity and a second opposite conductivity types, by subjecting ingot portions to chemical treatment based on hydrofluoric acid, nitric acid and acetic acid, enabling defects to be revealed on one of the portions corresponding to the transition between the first conductivity and the second conductivity types, a step of measuring the concentration of free charge carriers in a second area of the ingot, different from the first area, and a step for determining concentrations of dopant impurities in the sample from the position of the first area and the concentration of free charge carriers in the second area of the ingot.
申请公布号 US2014167731(A1) 申请公布日期 2014.06.19
申请号 US201214235327 申请日期 2012.07.20
申请人 Dubois Sebastien;Enjalbert Nicolas;Veirman Jordi 发明人 Dubois Sebastien;Enjalbert Nicolas;Veirman Jordi
分类号 G01N27/20 主分类号 G01N27/20
代理机构 代理人
主权项 1. A method for determining concentrations of dopant impurities in a silicon sample comprising the following steps: providing a silicon ingot comprising dopant impurities of donor type and dopant impurities of acceptor type; determining the a first area of the ingot in which a transition takes place between a first type of conductivity and an opposite second type of conductivity, by subjecting portions of the ingot to chemical treatment based on hydrofluoric acid, nitric acid, and acetic or phosphoric acid, enabling defects to be revealed on one of the portions corresponding to the transition between the first conductivity type and the second conductivity type, the first area being associated with a first height position in the ingot: measuring the free charge carrier concentration in a second area of the ingot, different from the first area; and determining the concentrations of dopant impurities in the sample from the first height position of the first area and the free charge carrier concentration in the second area of the ingot.
地址 Scionzier FR