发明名称 |
ALIGNMENT MARK DESIGN FOR SEMICONDUCTOR DEVICE |
摘要 |
Better alignment mark designs for semiconductor devices may substantially lessen the frequency of layer misalignment scanner alignment problems. Exemplary alignment mark designs substantially avoid or minimize damage during the fill-in and etching and chemical mechanical processing processes. Thus, additional processing steps to even out various layers or to address the misalignment problems may also be avoided. |
申请公布号 |
US2014167297(A1) |
申请公布日期 |
2014.06.19 |
申请号 |
US201414185746 |
申请日期 |
2014.02.20 |
申请人 |
MACRONIX INTERNATIONAL CO., LTD. |
发明人 |
Tsai Feng-Nien |
分类号 |
H01L23/544 |
主分类号 |
H01L23/544 |
代理机构 |
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代理人 |
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主权项 |
1. An alignment mark region of a semiconductor device, the alignment mark region comprising:
an array of alignment marks comprising a plurality of alignment columns, the alignment columns each having a plurality of alignment marks defining rows of the array, wherein adjacent alignment marks in the plurality of alignment columns are separated by a first separation, and wherein adjacent alignment columns are separated by a second separation.
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地址 |
Hsinchu TW |