| 摘要 |
The present invention relates to a positive photosensitive resin composition comprising (A) a modified novolac-type phenolic resin comprising an unsaturated hydrocarbon group, (B) a novolac-type phenolic resin obtained from meta-cresol and para-cresol, (C) a novolac-type phenolic resin obtained from ortho-cresol, (D) a compound that generates an acid from light, and (E) a polybasic acid or a polybasic acid anhydride. The content of the (E) component is less than 40 parts by mass relative to a total amount of 100 parts by mass of the (A) component, the (B) component, the (C) component, and the (D) component. |
