发明名称 SUBSTRATE PROCESSING DEVICE, APPLICATION METHOD FOR SUBSTRATE DEVICE AND STORAGE MEDIUM
摘要 A substrate processing device comprises: a loading port into which a carrying container is conveyed; a detection unit for detecting a storage state of a substrate in the carrying container conveyed into the loading port and having the cover removed therefrom; a processing unit for processing the substrate picked up from the carrying container conveyed into the loading port; and a control unit. The control unit executes: a first step of detecting the storage state of the substrate in the carrying container before the substrate is taken away from the carrying container conveyed into the loading port and forwarded to the processing unit; a second step of detecting the storage state of the substrate in the carrying container before the cover is closed and after the substrate processed by the processing unit is put back into the original carrying container; and a third step of determining whether or not the carrying container is abnormal on the basis of the first step and the second step.
申请公布号 WO2014088078(A1) 申请公布日期 2014.06.12
申请号 WO2013JP82744 申请日期 2013.12.05
申请人 TOKYO ELECTRON LIMITED 发明人 MORIKAWA KATSUHIRO;SUNAKA IKUO
分类号 H01L21/677;H01L21/67 主分类号 H01L21/677
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