| 发明名称 |
LITHOGRAPHIC PATTERNING OF INSULATING OR SEMICONDUCTING SOLID STATE MATERIAL IN CRYSTALLINE FORM |
| 摘要 |
<p>A method for lithographic patterning of an insulating or semiconducting solid state material in crystalline form, said method comprising a step where said material is exposed to an amount of radiation which is sufficient to change its insulating or semiconducting state into a conducting state.</p> |
| 申请公布号 |
WO2014080367(A1) |
申请公布日期 |
2014.05.30 |
| 申请号 |
WO2013IB60328 |
申请日期 |
2013.11.22 |
| 申请人 |
ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL) |
发明人 |
MOSER, SIMON KARL;MORESCHINI, LUCA;ROTENBERG, ELI |
| 分类号 |
G03F7/00;G03F7/004 |
主分类号 |
G03F7/00 |
| 代理机构 |
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