| 发明名称 |
ETCHANT COMPOSITION FOR AG THIN LAYER AND METHOD FOR FABRICATING METAL PATTERN USING THE SAME |
| 摘要 |
The present invention relates to an etchant composition of multiple layers composed of a single layer of Ag or Ag alloy or the single layer and an indium oxide layer. The etchant composition contains nitric acid of 2-4.0 wt%, sulfuric acid of 4.0-6.0 wt%, ferric salt of 0.1-2.0 wt%, and residual water. |
| 申请公布号 |
KR20140063284(A) |
申请公布日期 |
2014.05.27 |
| 申请号 |
KR20120130463 |
申请日期 |
2012.11.16 |
| 申请人 |
DONGWOO FINE-CHEM CO., LTD. |
发明人 |
JANG, SANG HOON;SHIM, KYUNG BO;LEE, SUCK JUN |
| 分类号 |
C23F1/30;H05K3/06 |
主分类号 |
C23F1/30 |
| 代理机构 |
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