SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME AND APPARATUS FOR PROCESSING A SUBSTRATE

摘要

The present invention relates to a semiconductor device and a method of manufacturing the same. A semiconductor device includes a substrate which includes an active region defined by a device isolation pattern, a lower part which is arranged on the substrate and has an upper part and a lower part which has a width wider than that of the upper part, a floating gate which includes a stepped part which is arranged between the upper part and the lower part, a dielectric film which is arranged on the floating gate, and a control gate which is arranged on the dielectric film. The lower part of the floating gate has a height of 4 nm or more.