| 摘要 |
The present invention relates to a mask blank which uses a photomask in which a pattern is formed and is manufactured with the photomask used in order to transfer the pattern on a substance to be transferred by irradiating exposure light. The mask blank is characterized by being formed with a filter film having optical properties on a substrate, wherein a penetration ratio on the exposure light in a wavelength range of 300-400 nm among the exposure light is 80% or more, a penetration ratio on the exposure light in a wavelength range of 420 nm is 40% or less, and a penetration ratio on the exposure light in a wavelength range of 450 nm or more is 20% or less. The present invention is considered to be helpful to overcome resolution limitations in order to realize the micropattern of an exposure device under the exposure light of the exposure device since the filter film which transmits exposure light in a wavelength range of 400 nm or less and nearly blocks exposure light in a wavelength range of 450 nm or more is equipped. Additionally, the present invention is able to perform filtering on undesirable exposure light without installing an optical filter on the exposure device. |
