发明名称 |
Method for improving uniformity of high-frequency plasma discharge by means of frequency modulation |
摘要 |
A method for improving the uniformity of high-frequency discharge plasma by means of frequency modulation is disclosed. In a plasma discharge chamber, there is a pair of parallel electrodes. A high-frequency power supply is adopted to feed the electrodes. The frequency range of the electromagnetic field is 13.56 MHz˜160 MHz. Discharge gas is input to form plasma. The frequency of the fed-in high-frequency electromagnetic field is under automatic tuning control, and keeps changing cyclically without stop in the course of plasma discharge. The range of the frequency change may fall into either a portion of or the entire range of 13.56 MHz˜160 MHz and makes the locations with higher plasma density on the plane in parallel with the electrodes and in the plasma discharge space changed cyclically. In a time slot longer than one frequency change cycle, the average plasma density between the parallel electrodes is uniform. |
申请公布号 |
US8704445(B2) |
申请公布日期 |
2014.04.22 |
申请号 |
US201213526484 |
申请日期 |
2012.06.18 |
申请人 |
WANG BO;XU LICHUN;ZHANG MING;WANG RUZHI;SONG XUEMEI;HOU YUDONG;ZHU MANKANG;LIU JINGBING;WANG HAO;YAN HUI;BEIJING UNIVERSITY OF TECHNOLOGY |
发明人 |
WANG BO;XU LICHUN;ZHANG MING;WANG RUZHI;SONG XUEMEI;HOU YUDONG;ZHU MANKANG;LIU JINGBING;WANG HAO;YAN HUI |
分类号 |
H01J7/24 |
主分类号 |
H01J7/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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