METHOD AND SYSTEM FOR MONITORING A PROCESS

摘要

Disclosed are a process monitoring method and a system. According to an embodiment of the present invention, provided is the process monitoring system which includes an exhaust line communicating with a chamber, a first monitoring line divided from the exhaust line in a first direction; and a second monitoring line divided from the exhaust line in a second direction and which is characterized in that light generated in the first monitoring line is output to the second monitoring line. The process monitoring method and the system of the present invention divide a monitoring line in which light is output and a monitoring line in which a plasma process is conducted and deposit, at a minimum, polymer generated in a plasma transformation process on a window outputting the light, thereby not decreasing the sensitivity of the light even in a monitoring process.