发明名称 Method for fabricating patterned polyimide film and applications thereof
摘要 A method for fabricating a patterned polyimide film, wherein the method comprises steps as follows: Firstly, a polyimide film is provided on a substrate. A wet planarization process is then performed to remove a portion of the polyimide film. Subsequently the planarized polyimide film is patterned.
申请公布号 US8642485(B2) 申请公布日期 2014.02.04
申请号 US201213517804 申请日期 2012.06.14
申请人 LIN CHIN-YI;UNITED MICROELECTRONICS CORPORATION 发明人 LIN CHIN-YI
分类号 H01L21/302 主分类号 H01L21/302
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