发明名称 |
Immersion lithographic apparatus with immersion fluid re-circulating system |
摘要 |
A lithographic apparatus includes a projection system, a fluid handling structure, a metrology device, and a recycling control device. The projection system is configured to project a patterned radiation beam onto a target portion of a substrate, the substrate being supported on a substrate table. The fluid handling structure is configured to provide an immersion fluid to a space between the projection system and the substrate and/or substrate table. The metrology device is configured to monitor a parameter of the immersion fluid. The recycling control device regulates a routing of the immersion fluid either to be reused by the fluid handling structure or to be reconditioned based on the quality of immersion fluid indicated by the metrology device. |
申请公布号 |
US8629970(B2) |
申请公布日期 |
2014.01.14 |
申请号 |
US20090355039 |
申请日期 |
2009.01.16 |
申请人 |
SEWELL HARRY;LOOPSTRA ERIK ROELOF;MULKENS JOHANNES CATHARINUS HUBERTUS;MARKOYA LOUIS JOHN;MCCAFFERTY DIANE;ASML NETHERLANDS B.V.;ASML HOLDING NV |
发明人 |
SEWELL HARRY;LOOPSTRA ERIK ROELOF;MULKENS JOHANNES CATHARINUS HUBERTUS;MARKOYA LOUIS JOHN;MCCAFFERTY DIANE |
分类号 |
G03B27/52;G03B27/32 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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