发明名称 |
PATTERN FORMATION METHOD, PATTERN FORMATION DEVICE, AND COMPUTER READABLE STORAGE MEDIUM |
摘要 |
PROBLEM TO BE SOLVED: To provide a pattern formation method capable of avoiding increase of manufacturing costs or deterioration of a throughput when a pattern is formed by block copolymer.SOLUTION: A pattern formation method includes steps of: forming a film of block copolymer containing at least two kinds of polymer on a film; separating at least the two kinds of polymer from each other by heating the film of the block copolymer; acquiring an image of a surface of the film of the block copolymer in which at least the two kinds of polymer are separated from each other; and determining whether at least the two kinds of polymer are properly separated from each other according to the image. |
申请公布号 |
JP2013247159(A) |
申请公布日期 |
2013.12.09 |
申请号 |
JP20120117949 |
申请日期 |
2012.05.23 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
MURAMATSU MAKOTO;KITANO TAKAHIRO;TOMITA TADATOSHI;TAUCHI HIROSHI |
分类号 |
H01L21/027;H01L21/3205;H01L21/768 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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