发明名称 PATTERN FORMATION METHOD, PATTERN FORMATION DEVICE, AND COMPUTER READABLE STORAGE MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide a pattern formation method capable of avoiding increase of manufacturing costs or deterioration of a throughput when a pattern is formed by block copolymer.SOLUTION: A pattern formation method includes steps of: forming a film of block copolymer containing at least two kinds of polymer on a film; separating at least the two kinds of polymer from each other by heating the film of the block copolymer; acquiring an image of a surface of the film of the block copolymer in which at least the two kinds of polymer are separated from each other; and determining whether at least the two kinds of polymer are properly separated from each other according to the image.
申请公布号 JP2013247159(A) 申请公布日期 2013.12.09
申请号 JP20120117949 申请日期 2012.05.23
申请人 TOKYO ELECTRON LTD 发明人 MURAMATSU MAKOTO;KITANO TAKAHIRO;TOMITA TADATOSHI;TAUCHI HIROSHI
分类号 H01L21/027;H01L21/3205;H01L21/768 主分类号 H01L21/027
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